Semiconductor Wafers Ultrasonic Cleaning System 100KW Automated Ultrasonic Cleaner

Jietai, Fully Automatic Ultrasonic Cleaning System For Semiconductor Wafers

1. Intelligent Cleaning: The equipment adopts a fully automatic feeding and discharging cleaning mode to clean the silicon wafers. Meanwhile, the equipment is compatible with cleaning silicon wafers of various sizes, and has strong expandability.
2. Intelligent Operation: The equipment is equipped with a Programmable Logic Controller (PLC) and a touch screen, enabling one-click replacement of different cleaning modes.
3. Multifunctional Cleaning: During the cleaning process, not only ultrasonic cleaning is used, but also a variety of cleaning methods such as spraying, shaking, bubbling, and jetting are employed.
4. Rotating System: The equipment is equipped with a rotating system. The silicon wafers keep rotating during the cleaning process, and the rotation speed can be adjusted according to the cleaning process, improving the cleaning quality of the silicon wafers.
5. Automatic Liquid Change: The equipment is equipped with an automatic water inlet and outlet system, an automatic liquid adding system, a filtration circulation system, and can automatically monitor the cleaning process to ensure the quality of the cleaning solution.
6. Detection System: The cleaning tank of the equipment is equipped with an online pH monitor and an online pure water monitor, which can continuously monitor the cleaning status and ensure that the cleaning process meets the set requirements.
7. From Process Customization to Fast Delivery
   1. One-Stop Process Solution
   • Free Sample Testing: Customers send 30 samples, and a Cleanliness Test Report (including particle size distribution, surface roughness, and contact angle test data) will be issued within 48 hours.
   • Customized Fixture Design: A team of professional engineers can provide fixture clamping solutions (such as special-shaped hole positioning and thin-edge support structures) based on the 3D drawings of the frame to ensure no blind spots in cleaning.
   2. Full-Cycle Service Guarantee
   • 7×24 Hour Response: Five major service centers nationwide (Pearl River Delta / Yangtze River Delta / Beijing-Tianjin-Hebei / Chengdu-Chongqing / Wuhan) stock a full range of vulnerable parts (transducers, spray nozzles, heating tubes) and can arrive on-site within 4 hours.
   • Remote Operation and Maintenance System: Real-time monitoring of equipment status through the industrial internet platform, automatic early warning of potential faults such as filter element blockage and temperature anomalies, with an average trouble shooting time (MTTR) ≤ 2 hours.

   

   

   

   

   

Semiconductor Wafers Ultrasonic Cleaning System

Ultrasonic Cleaning System 100KW

100KW Automated Ultrasonic Cleaner

Semiconductor Wafers Ultrasonic Cleaning System 100KW Automated Ultrasonic Cleaner Images